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- Application of Wear-Resistant Alumina Ceramic Lined Engineering Equipment
- Advanced Ballistic Ceramic Materials:Properties and Applications of Alumina, Silicon Carbide, and Silicon Nitride
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Latest articles
- Application of Wear-Resistant Alumina Ceramic Lined Engineering Equipment
- Advanced Ballistic Ceramic Materials:Properties and Applications of Alumina, Silicon Carbide, and Silicon Nitride
- Wear-Resistant Alumina Ceramic Perforated Plate (Holed Lining Brick): Technical Specifications and Industrial Applications
- Pingxiang Chemshun Ceramics Provides Customizable Shapes of Wear-Resistant Alumina Ceramic Liners
- Chemshun 2026 Chinese New Year Holiday Notice
- Wear-Resistant Alumina Ceramic Lined Pipe: The Core of Industrial Wear Solutions
- Ceramic Drum Lagging: The High-Performance Solution for Extreme Conditions
- 99.7% Alumina Ceramic Grinding Disc: High-Precision Grinding Solution
- Alumina Ceramic Liners: A Reliable Anti-Wear Solution for Mill Equipment
- Alumina Ceramic Grinding Balls: High-Performance Grinding Media
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High-purity Alumina Ceramic Wafer Polishing Plate
Ceramic grinding disc is made of high quality ceramic material, easy to clean after grinding. Ceramic grinding disc is mainly used for fine grinding of various materials, especially suitable for grinding of brittle materials such as crystals, ceramics and glass. The surface of the grinding disc is evenly distributed with grooves, and a certain amount of abrasive can be stored during the grinding process to ensure the smooth grinding process. Ceramic grinding disc can be made into different sizes according to different grinding and polishing models. Ceramic grinding disk hardness, heavy weight, smooth operation during rotation, with a certain flatness and parallelism, to ensure that the sample after grinding will be high quality grinding surface.
Chemshun alumina wafer polishing plate/turn table is made of high purity 99.7-99.9% alumina. High-purity alumina ceramic features outstanding rigidity and excellent wear-resistance for wafer polishing and maintains good surface shape over a long period of time.It is shaped by PIBM. It is a member of the semiconductor industry because of its unparalleled thermal and dimensional stability and resistance to severe microchip processing equipment environments.
Chemical Mechanical Planarization (CMP) wafer polishing tables and plates require strong abrasion, corrosion resistance, and extreme stiffness to produce pristine flat, polished surfaces. Chemshun Direct Sintered Al2O3 components deliver this high performance for CMP polishing tables, plates, and other critical components for semiconductor and flat panel display applications.









